General Introduction

The Focused Ion Beam (FIB) microscope available at the FELMI is combined with a Scanning Electron Microscope (SEM) to a dual beam microscope (DBM) (FEI Nova 200 Nanolab) enabling material inspection, subtractive structuring by the ion beam, additive structuring by both beams, nanomanipulation and prototyping down to the nano range.

The finely focused beam of Ga+ ions (down to 7 nm) can be used to remove material locally (sputtering) allowing for visualizing of material peculiarities underneath the surface. In combination with the patterning capabilities of the FIB microscope allow for the fabrication of complex structures with a minimum line width of about 25 nm (depending on material and line depth).

Different gas injection systems introduce special precursor gases to the microscope which are decomposed by the ion or the electron beam on the sample surface allowing for the deposition of functional structures in the micro and nano range. Currently, Pt and SiXOY can be deposited in our lab routinely, completed by a custom gas injection system for other precursors.

Analytic extensions (backscatter detector, energy dispersive X-ray spectroscopy) allow furthermore for the chemical analyses of materials which exploit their full potential in combination with the ion beam towards 3-dimensional reconstruction of bulk materials.
Finally, the DBM system allows for site specific preparation of Transmission Electron Microscopes (TEM) suited lamellas which makes this tool to an essential part in science and technology.